Shares of Dutch semiconductor equipment leader ASML dropped more than 8% on Monday following a report that China has started producing domestically developed immersion deep ultraviolet (DUV) lithography machines. The milestone signals a potential shift in the global chipmaking supply chain as Beijing accelerates efforts to reduce dependence on Western technology amid tightening export controls.

China's domestic DUV breakthrough

According to The Information, the state-backed immersion DUV machines are expected to be delivered later this year to major Chinese chipmakers, including Semiconductor Manufacturing International Corp. (SMIC), Hua Hong Semiconductor, and ChangXin Memory Technologies (CXMT). Production has reportedly begun, though the manufacturer's identity remains undisclosed due to the project's sensitivity.

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Lithography systems are among the most complex tools in semiconductor fabrication, using light to etch intricate circuit patterns onto silicon wafers. ASML dominates the global market for advanced lithography and is the sole supplier of extreme ultraviolet (EUV) machines used for cutting-edge chips. After US and Dutch export bans blocked EUV sales to China, Chinese firms relied heavily on ASML's older immersion DUV systems, which became a key revenue source as they stockpiled equipment ahead of further restrictions.

Ripple effects across the equipment sector

The selloff extended beyond ASML, with US-based equipment makers Applied Materials, Lam Research, and KLA Corp falling nearly 5%, 7%, and 4%, respectively. Investors interpreted the news as a broader threat to Western semiconductor equipment suppliers, fearing that China's ability to produce competitive DUV tools could eventually localize more of its chipmaking supply chain, reducing the long-term addressable market for foreign companies.

While ASML specializes in lithography, Applied Materials, Lam Research, and KLA provide tools for other critical stages such as material deposition, etching, and defect inspection. A successful domestic DUV program could accelerate China's push for self-sufficiency, potentially diminishing the role of Western equipment in one of the world's largest semiconductor markets.

Limited production for now

Despite the breakthrough, analysts caution that China's DUV machines still trail ASML's in performance and reliability. The report indicates only about five immersion DUV units are scheduled for delivery this year, with roughly 20 planned by 2027. The technology requires further testing before large-scale commercial deployment, allowing ASML to maintain a near-term technological edge.

China is also developing a domestic EUV lithography system, but that effort reportedly remains at the prototype stage. Immersion DUV currently represents the most advanced lithography available to Chinese chipmakers following restrictions on EUV access.

Timing and geopolitical context

The reported manufacturing milestone coincides with Washington considering additional export controls on semiconductor equipment and servicing to China. The US Congress is advancing the MATCH Act, bipartisan legislation aimed at further limiting China's ability to purchase or maintain advanced DUV equipment from foreign suppliers. If domestic alternatives prove viable, the effectiveness of such restrictions could diminish over time.

For Beijing, developing homegrown lithography has become a strategic priority as geopolitical tensions reshape global semiconductor supply chains. While the latest report does not suggest China has matched ASML's capabilities, it indicates that long-term efforts to reduce reliance on foreign equipment are yielding tangible results. For investors, Monday's market reaction reflects concerns that even limited domestic production could eventually alter the competitive landscape in one of the industry's most strategically important segments.

This article is for informational purposes only and does not constitute financial advice.